Journal of Computer Applications (计算机应用) 2013/33:12 PP.3317-3320
Silicon anisotropic etching simulation is time-consuming due to its complex chemical process. In order to accelerate the process, the GPU-based silicon anisotropic etching parallel simulation was discussed, and an improved parallel method was proposed to improve the direct parallelization of serial algorithms method with low efficiency. In this method, the parallel load of the direct parallelization was increased, the memory management cost was reduced, and the acceleration performance was improved. The experimental results show that the method can achieve a simulation with higher speedup.